张静

发布者:材料科学与工程学部发布时间:2024-08-14浏览次数:10

联系方式:jingzhang@qlu.edu.cn

教育及工作经历:

2020.08至今  齐鲁工业大学(山东省科学院)新材料研究所   助理研究员

2018.9-2019.9    法国国家科研中心      联合培养博士

2015.6-2020.6    中国地质大学(北京)           硕博贯通博士

2011.9-2015.6    济南大学                                   学士

主要研究领域:超级电容器和钠离子电池储能研究,包括掺硼金刚石的微纳结构设计及其超级电容器性能研究,全固态柔性可折叠超级电容器的设计与应用研究,以及钠离子电池正极材料微结构构筑及其应用研究等。

科研项目

山东省自然科学基金青年基金(主持,2023.01-2025.12

科教产融合试点工程基础研究类项目(主持,2022.01-2023.12

中央高校优秀导师基金项目(主持,2018.01-2018.12

山东省重大科技创新工程项目(参与,2017.01-2020.12

国家自然科学基金项目(参与,2015.01-2019.12

发表论文:

[1] J Zhang, et. al.; Construction of flexible fiber boron-doped diamond film and its supercapacitor application, Journal of Colloid and Interface Science, 2022, 629: 813-821. 中科院一区, IF=9.965.

[2] J Zhang, et. al.; Preparation of nanowires on free-standing boron-doped diamond films for high performance micro-capacitors, Electrochimica Acta, 2022, 421:1405-1411. 中科院二区top, IF= 7.336.

[3] J Zhang, et. al.; Preparation of boron-doped diamond nanowires on porous Ti substrate for high-performance super-capacitors, Electrochimica Acta, 2020, 354: 1366-1379. 中科院二区top, IF= 7.336.

[4] J Zhang, et. al.; Preparation of boron-doped diamond foam film for supercapacitor applications, Applied Surface Science, 2020, 506: 4645-4655.  中科院一区, IF= 7.392.

[5] J Zhang, et. al.; Adjusting surface morphology of substrate to improve the capacitive performance for the formed boron doped diamond electrode, Applied Surface Science, 2019, 491: 814-822.  中科院一区, IF= 7.392.

[6] J Zhang, et. al.; Influence of pore size of Ti substrate on structural and capacitive properties of Ti/boron doped diamond electrode, Journal of Alloys and Compounds, 2019, 777:84-93.  中科院二区top, IF= 6.371.

[7] J Zhang, et. al.; Influences of interfacial carbonization on the structure and mechanical properties of multilayered Cr containing diamond-like carbon films, Journal of Physical Chemistry C, 2017, 121:6781-6787. 中科院二 区top, IF=4.17.

[8] J Zhang, et. al.; Adjusting pore size and shape to achieve the desired capacitance of boron-doped diamond electrodes,Surface Review and Letters, 2019, 26: 1830009-13.  中科院四区, IF=1.152.

发明专利

[1] 于翔,张静一种分析界面碳化对 Cr/DLC 多层膜影响的方法(发明专利,授权ZL201610910974.2

[2] 张静,赵志岩等一种柔性可弯曲钽基掺硼金刚石薄膜及其制备方法和应用(发明专利,实审202210695021.4

[3] 张静,于翔等一种自支撑掺硼金刚石薄膜纳米线的制备方法(发明专利,实审202111250868.3

[4] 张静,赵志岩等一种柔性可弯曲钛基掺硼金刚石薄膜及其制备方法和应用(发明专利,实审202210695022.9

其它成果

国家留学基金委公派出国奖学金

北京市优秀毕业生

2019 年度国家奖学金